Chapter 1 A Review of Materials Science 1.1. Introduction1.2. Structure1.3. Defects in Solids 1.4. Bonds and Bands in Materials 1.5. Thermodynamics of Materials 1.6. Kinetics1.7. Nucleation 1.8. An Introduction to Mechanical Behavior1.9. ConclusionExercisesReferencesChapter 2 Vacuum Science and Technology 2.1. Introduction2.2. Kinetic Theory of Gases 2.3. Gas Transport and Pumping 2.4. Vacuum Pumps2.5. Vacuum Systems 2.6. ConclusionExercisesReferencesChapter 3 Thin-Film Evaporation Processes3.1. Introduction3.2. The Physics and Chemistry of Evaporation 3.3. Film Thickness Uniformity and Purity3.4. Evaporation Hardware3.5. Evaporation Processes and Applications 3.6. ConclusionExercisesReferencesChapter 4 Discharges, Plasmas, and Ion-Surface Interactions4.1. Introduction 4.2. Plasmas, Discharges, and Arcs 4.3. Fundamentals of Plasma Physics 4.4. Reactions in Plasmas4.5. Physics of Sputtering 4.6. Ion Bombardment Modification of Growing Films4.7. ConclusionExercisesReferencesChapter 5 Plasma and Ion Beam Processing of Thin Films5.1. Introduction 5.2. DC, AC, and Reactive Sputtering Processes5.3. Magnetron Sputtering5.4. Plasma Etching5.5. Hybrid and Modified PVD Processes 5.6. ConclusionExercisesReferencesChapter 6 Chemical Vapor Deposition6.1. Introduction6.2. Reaction Types 6.3. Thermodynamics of CVD 6.4. Gas Transport6.5. Film Growth Kinetics 6.6. Thermal CVD Processes 6.7. Plasma-Enhanced CVD Processes 6.8. Some CVD Materials Issues 6.9. Safety6.10. Conclusion ExercisesReferencesChapter 7 Substrate Surfaces and Thin-Film Nucleation 7.1. Introduction 7.2. An Atomic View of Substrate Surfaces 7.3. Thermodynamic Aspects of Nucleation7.4. Kinetic Processes in Nucleation and Growth 7.5. Experimental Studies of Nucleation and Growth7.6. Conclusion ExercisesReferencesChapter 8 Epitaxy8.1. Introduction8.2. Manifestations of Epitaxy8.3. Lattice Misfit and Defects in Epitaxial Films8.4. Epitaxy of Compound Semiconductors8.5. High-Temperature Methods for Depositing Epitaxial Semiconductor Films8.6. Low-Temperature Methods for Depositing Epitaxial Semiconductor Films8.7. Mechanisms and Characterization of Epitaxial Film Growth8.8. ConclusionExercisesReferences Chapter 9 Film Structure9.1. Introduction9.2. Structural Morphology of Deposited Films and Coatings9.3. Computational Simulations of Film Structure9.4. Grain Growth, Texture, and Microstructure Control in Thin Films9.5. Constrained Film Structures9.6. Amorphous Thin Films 9.7. ConclusionExercisesReferencesChapter 10 Characterization of Thin Films and Surfaces10.1. Introduction10.2. Film Thickness10.3. Structural Characterization of Films and Surfaces10.4. Chemical Characterization of Surfaces and Films10.5. ConclusionExercisesReferencesChapter 11 Interdiffusion, Reactions, and Transformations in Thin Films11.1. Introduction 11.2. Fundamentals of Diffusion11.3. Interdiffusion in Thin Metal Films11.4. Compound Formation and Phase Transformations in Thin Films11.5. Metal-Semiconductor Reactions11.6. Mass Transport in Thin Films under Large Driving Forces11.7. ConclusionExercisesReferencesChapter 12 Mechanical Properties of Thin Films 12.1. Introduction12.2. Mechanical Testing and Strength of Thin Films 12.3. Analysis of Internal Stress12.4. Techniques for Measuring Internal Stress in Films12.5. Internal Stresses in Thin Films and Their Causes12.6. Mechanical Relaxation Effects in Stressed Films12.7. Adhesion12.8. ConclusionExercisesReferences