High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes.
Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
Key Features
- Includes a comprehensive description of the HiPIMS process from fundamental physics to applications
- Provides a distinctive link between the process plasma and thin film communities
- Discusses the industrialization of HiPIMS and its real world applications
1. Introduction (particle surface interaction)
o Sputtering (background)
o Magnetron sputtering
o Magnetron configurations
o Overview of pulsed magnetron discharges
2. Power coupling
o HiPIMS generator
o HiPIMS bias
o Multi-cathode configurations
o Superposition
3. HiPIMS process characteristics
o Electrons: Electron energy, electron density, and electrical potentials
o Ions: Ion flux, energy, and composition
o Deposition rate
o Self-sputtering
4. Reactive HiPIMS
o Fundamentals
o Experimental results
5. HiPIMS modeling
o Types
o Results
6. Physics of HiPIMS
o Deposition rate
o Transport of charged species
o Modes of operation
o Reactive HiPIMS
7. HiPIMS thin films
o Deposition on complex-shaped substrates
o Phase composition tailoring
o Control of film microstructure
o Interface engineering
o Protecting films (corrosion, hardness, adhesion etc)
o Films for electronic applications
8. Industrialization of HiPIMS
o Up-scaling
o Rotating magnetron sputtering
o Examples of industrially relevant thin films
- Bishop, Vacuum Deposition onto Webs, Films and Foils, 3e, 2015, 9780323296441, $220.00
- Wasa, Handbook of Sputter Deposition Technology, 2e, 2012, 9781437734836, $169.00
- Mattox, Handbook of Physical Vapor Deposition (PVD) Processing, 2e, 2010, 9780815520375, $295.00
Researchers within the Vacuum equipment, semiconductor, automotive, aeronautic, glass, and medical applications industries and academics within the Materials science, plasma physics, and nanomaterials areas
