Materials Science of Thin Films - Edition 3 - By Tomas Kubart, Kostas Sarakinos, Ph.D.,Physics, RWTH Aachen University, Germany, Grégory Abadias, Panos Patsalas and Daniel Gall Elsevier Inspection Copies

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Materials Science of Thin Films,

Edition 3 Deposition and Structure

By Tomas Kubart, Kostas Sarakinos, Ph.D.,Physics, RWTH Aachen University, Germany, Grégory Abadias, Panos Patsalas and Daniel Gall

Publication Date: 01 Sep 2025

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Since 1992, when Ohring’s Materials Science of Thin Films: Deposition and Structure was published as the first true textbook on thin films, the field has expanded tremendously, especially with regard to technological applications. Intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films as well as scientists and engineers who are entering the field or require an overview of thin films, the book provides the most comprehensive coverage of materials science and technology related to thin films and coatings of any book. The 3rd edition brings the book up-to-date with the most important advances made since the publication of the previous edition. All chapters have been fully revised and include new illustrations, examples and exercises.

Key Features

Content has been fully updated to include coverage of the latest and most important deposition techniques, including atomic layer deposition and high impulse magnetron sputtering
Includes new or expanded coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth.
Contains fully updated illustrations, new examples and 2 x00 fully revised and expanded end-of-chapter problems

About the author

By Tomas Kubart, Department of Engineering Sciences, Uppsala University, Uppsala, Sweden; Kostas Sarakinos, Ph.D.,Physics, RWTH Aachen University, Germany, Nanoscale Engineering, Linköping University, Sweden; Grégory Abadias, Physics Department, University of Poitiers, France; Panos Patsalas, Physics Department, Aristotle University of Thessaloniki, Greece and Daniel Gall, Associate Professor, Rensselaer Polytechnic Institute, Troy, NY, USA

1. Introduction to Thin Films
2. Vacuum Science and Technology
3. Thin-Film Evaporation Processes
4. Discharges, Plasmas, and Ion-Surface Interactions
5. Plasma and Ion Beam Processing of Thin Films
6. Chemical Vapor Deposition
7. Substrate Surfaces and Thin-Film Nucleation
8. Epitaxy
9. Film Structure
10. Characterization of Thin Films and Surfaces
11. Interdiffusion, Reactions, and Transformations in Thin Films
12. Mechanical Properties of Thin Films

ISBN: 9780128225400

Page Count: 784

Retail Price : £99.95

9780081005996; 9780081020517; 9780123851321; 9780128123119; 9780081020739

Upper level undergraduate and graduate students in materials science, chemical and electrical engineering (In the US, thin film courses are taught at approximately 50 engineering schools, with 800 enrolled students annually)

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